|
Kurt Ronse, Director of the Advanced Patterning Program Director at imec, explains how the opening of the joint ASML-imec High NA EUV Lithography Lab marks a milestone in preparing High NA EUV lithography for accelerated adoption in mass manufacturing - offering an early development platform to the leading-edge semiconductor ecosystem.
|
|
|
Thomas Signamarcheix, Executive Vice President, Technology Planning & Strategic Programs, CEA-Leti, explains the recently announced NY CREATES, SPINTEC and CEA-Leti strategic partnership that will initially focus on the research and co-development of magnetic memory devices, which are used to store computer data. SPINTEC and CEA-Leti will contribute with their expertise in magnetics, spintronics, nanofabrication and testing of related devices, and NY CREATES will provide the facilities, process integration expertise, and materials process development to run the 300mm silicon hardware.
|
|
|
Shinsuke Kitazawa, Product Manager and Sakura Lauhoff, Field Sales, both at Junkosha, talk through the company’s first ever appearance at SEMICON West, highlighting two new innovations – High Barrier PFA Tubing and the Super Low Outgassing (SLO) cable - alongside the recently introduced Flat and High-Flex Cable Designer production selection tool. Junkosha will be showcasing these technology innovations and demonstrating how its (customised) engineering excellence can benefit the semiconductor industry at the forthcoming SEMICON Europa event.
|
|
|
Marianela Urgellés, Managing Director of CINDE, an organisation expert in Foreign Direct Investment attraction, retention, and expansion for Costa Rica, explains why the country - selected as a strategic US CHIPS Act partner – is well positioned to grow its semiconductor ecosystem in support of the global industry’s focus on accessing workforce talent, addressing supply chain challenges and sustainability.
|
|
|